For our geometry (a special structure) we start with 250rpm and a low ramp (5) for 5s, increase speed to 2500rpm at higher ramp (10) for 10s and finish with 3500rpm at high ramp (100) for another 5s

he solutions from Examples 1 through 6 were each spin-coated onto a 100-mm silicon wafer using a spin coater (Cee® 100CB from Brewer Science, Inc., Rolla, Mo.) at a spin speed of 1,250 rpm (250 rpm/s ramp) for 30 seconds, followed by baking on a hotplate

https://www.researchgate.net/post/How_do_you_adjust_the_speed_of_spin_coating_in_order_to_give_thickness_around_30_nanometer_on_thin_film_of

http://www.google.com/patents/US20130201635