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12:36 Aug 25, 2009 |
German to English translations [PRO] Science - Physics / Plasma nitriding - sputtering | |||||||
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| Selected response from: Kim Metzger Mexico Local time: 09:19 | ||||||
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Summary of answers provided | ||||
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3 +1 | rough process residues/process residue deposits |
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rough process residues/process residue deposits Explanation: I think, but I'm not sure. A method of cleaning process residues from the surface of a substrate processing chamber component having holes. In the method, the component is at least partially immersed into a cleaning solution having hydrafluoric acid and nitric acid, and a non-reactive gas is passed through the holes to prevent the cleaning solution from back-flowing into the holes during the cleaning process. The method is particularly useful for cleaning sputtering residue deposits from an electrostatic chuck used in a sputtering process. http://www.freepatentsonline.com/6821350.html |
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