18:20 Oct 8, 2013 |
English language (monolingual) [PRO] Tech/Engineering - Chemistry; Chem Sci/Eng / Semiconductor | |||||||
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| Selected response from: airmailrpl Brazil Local time: 18:54 | ||||||
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4 | two different tecnologies |
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Should gas etching be gas plasma etching? two different tecnologies Explanation: gas etching can be chemical .. gas plasma etching adds radio frequency (RF) energy Gaseous etching processes such as plasma etching have gained great importance in recent years as substitutes for wet chemical etching processes in the fabrication of integrated circuits (iCs) http://www.google.com/patents/EP0086816A1?cl=en Patent US6566269 - Removal of post etch residuals on wafer ... www.google.de/patents/US6566269 ... the fluorine and sulfur contaminants trapped in the photoresist layer of a semiconductor wafer during plasma gas etching of bonding pads and other features. Chemical gas etching of InP-based structures www.sciencedirect.com/science/article/pii/S016793179600161X In this paper we present our results on chemical gas etching (CGE) of InP-based structures using Cl2 as an etch gas. Structures are patterned using electron ... -------------------------------------------------- Note added at 1 hr (2013-10-08 20:12:27 GMT) -------------------------------------------------- plas·ma ˈplazmə/ noun noun: plasma; noun: plasm 2. an ionized gas consisting of positive ions and free electrons in proportions resulting in more or less no overall electric charge, typically at low pressures (as in the upper atmosphere and in fluorescent lamps) or at very high temperatures (as in stars and nuclear fusion reactors). Plasma is often called the "Fourth State of Matter," the other three being solid, liquid and gas. A plasma is a distinct state of matter containing a significant number of electrically charged particles, a number sufficient to affect its electrical properties and behavior. http://www.plasmacoalition.org/what.htm |
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